Journals in DBLP

IBM Journal of Research and Development
2001, volume: 45, number: 5

1. George J. Hefferon
   Preface. [Citation Graph (0, 0)][DBLP]
   IBM Journal of Research and Development, 2001, v:45, n:5, pp:603-604 [Journal]
   
2. A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes
   Review of technology for 157-nm lithography. [Citation Graph (0, 0)][DBLP]
   IBM Journal of Research and Development, 2001, v:45, n:5, pp:605-614 [Journal]
   
3. Rajinder S. Dhaliwal, William A. Enichen, Steven D. Golladay, Michael S. Gordon, Rodney A. Kendall, Jon E. Lieberman, Hans C. Pfeiffer, David J. Pinckney, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, Eileen V. Tressler
   PREVAIL-Electron projection technology approach for next-generation lithography. [Citation Graph (0, 0)][DBLP]
   IBM Journal of Research and Development, 2001, v:45, n:5, pp:615-638 [Journal]
   
4. David R. Medeiros, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Christopher K. Magg, Arpan P. Mahorowala, Wayne M. Moreau, Karen E. Petrillo, Marie Angelopoulos
   Recent progress in electron-beam resists for advaced mask-making. [Citation Graph (0, 0)][DBLP]
   IBM Journal of Research and Development, 2001, v:45, n:5, pp:639-650 [Journal]
   
5. Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham
   TCAD development for lithography resolution enhancement. [Citation Graph (0, 0)][DBLP]
   IBM Journal of Research and Development, 2001, v:45, n:5, pp:651-666 [Journal]
   
6. William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff
   Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. [Citation Graph (0, 0)][DBLP]
   IBM Journal of Research and Development, 2001, v:45, n:5, pp:667-682 [Journal]
   
7. Hiroshi Ito
   Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography. [Citation Graph (0, 0)][DBLP]
   IBM Journal of Research and Development, 2001, v:45, n:5, pp:683-696 [Journal]
   
8. Bruno Michel, André Bernard, Alexander Bietsch, Emmanuel Delamarche, Matthias Geissler, David Juncker, Hannes Kind, Jean-Philippe Renault, Hugo E. Rothuizen, Heinz Schmid, Patrick Schmidt-Winkel, Richard Stutz, Heiko Wolf
   Printing meets lithography: Soft approaches to high-resolution patterning. [Citation Graph (0, 0)][DBLP]
   IBM Journal of Research and Development, 2001, v:45, n:5, pp:697-0 [Journal]