Journals in DBLP
Bernard Courtois Special issue on European Micro and Nano Systems (EMN04) held in Paris, 20-21 October, 2004. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:613- [Journal ] Giuseppe Iannaccone Perspectives and challenges in nanoscale device modeling. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:614-618 [Journal ] Gary H. Bernstein , Alexandra Imre , V. Metlushko , Alexei O. Orlov , L. Zhou , L. Ji , G. Csaba , Wolfgang Porod Magnetic QCA systems. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:619-624 [Journal ] Y. Leprince-Wang , A. Yacoubi-Ouslim , G. Y. Wang Structure study of electrodeposited ZnO nanowires. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:625-628 [Journal ] K. Kakushima , T. Bourouina , T. Sarnet , G. Kerrien , D. Débarre , J. Boulmer , H. Fujita Silicon periodic nano-structures obtained by laser exposure of nano-wires. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:629-633 [Journal ] N. N. Dzbanovsky , V. V. Dvorkin , V. G. Pirogov , N. V. Suetin The aligned Si nanowires growth using MW plasma enhanced CVD. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:634-638 [Journal ] Ibrahima Kante , Thierry Devers , Rachid Harba , Caroline Andreazza-Vignolle , Pascal Andreazza Electrical behaviour of fractal nanosized tin dioxide films prepared by electrodeposition for gas sensing applications. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:639-643 [Journal ] Bradley E. Layton , Stephanie M. Sullivan , John J. Palermo , Gregory J. Buzby , Rishi Gupta , Richard E. Stallcup III Nanomanipulation and aggregation limitations of self-assembling structural proteins. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:644-649 [Journal ] N. Wilke , A. Mulcahy , S.-R. Ye , A. Morrissey Process optimization and characterization of silicon microneedles fabricated by wet etch technology. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:650-656 [Journal ] Haifa El-Sadi , Nabil Esmail Simulation of complex liquids in micropump. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:657-666 [Journal ] Jemmy S. Bintoro , Peter J. Hesketh , Yves H. Berthelot CMOS compatible bistable electromagnetic microvalve on a single wafer. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:667-672 [Journal ] F. Marty , L. Rousseau , B. Saadany , B. Mercier , O. Français , Y. Mita , T. Bourouina Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:673-677 [Journal ] Gen-Wen Hsieh , Ching-Hsiang Tsai , Wei-Chih Lin Anodic bonding of glass and silicon wafers with an intermediate silicon nitride film and its application to batch fabrication of SPM tip arrays. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:678-682 [Journal ] A. Pavolotsky , D. Meledin , C. Risacher , M. Pantaleev , V. Belitsky Micromachining approach in fabricating of THz waveguide components. [Citation Graph (0, 0)][DBLP ] Microelectronics Journal, 2005, v:36, n:7, pp:683-686 [Journal ]