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Y. S. Zheng, Q. Guo, Y. J. Su, P. D. Foo
Polymer residue chemical composition analysis and its effect on via contact resistance in dual damascene copper interconnects process integration. [Citation Graph (0, 0)][DBLP]
Microelectronics Journal, 2003, v:34, n:2, pp:109-113 [Journal]

Scores and Rank
SCEAS: 0.41721
SCEAS_PS: 0
SCEAS_BPS: 0
SCEAS_EPS: 0
SCEAS_BEPS: 0
SCEAS_B0: 3.11202
PAGE_RANK: 0.48050
HITS_H: 0
HITS_A: 0
BHITS_H: 0
BHITS_A: 0
SALSA_A: 0
SALSA_H: 0
BSALSA_A: 0
BSALSA_H: 0
P: 0
BCC: 0
citations_to_me: 0
citations_from_me: 0



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