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Publications of Author

1. Goodwin R. Chin, Walter C. Dietrich Jr., Duane S. Boning, Alexander S. Wong, Andrew R. Neureuther, Robert W. Dutton
   Linking TCAD to EDA - Benefits and Issues. [Citation Graph (0, 0)][DBLP]
   DAC, 1991, pp:573-578 [Conf]
   
2. Frank Gennari, Andrew R. Neureuther
   A Pattern Matching System for Linking TCAD and EDA. [Citation Graph (0, 0)][DBLP]
   ISQED, 2004, pp:165-170 [Conf]
   
3. Roberto Guerrieri, Andrew R. Neureuther
   Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 1988, v:7, n:7, pp:755-764 [Journal]
   
4. Roberto Guerrieri, Karim H. Tadros, John K. Gamelin, Andrew R. Neureuther
   Massively parallel algorithms for scattering in optical lithography. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 1991, v:10, n:9, pp:1091-1100 [Journal]
   
5. K. Lee, Andrew R. Neureuther
   SIMPL-2: (SIMulated Profiles from the Layout-Version 2). [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 1988, v:7, n:2, pp:160-167 [Journal]
   
6. Edward W. Scheckler, Andrew R. Neureuther
   Models and algorithms for three-dimensional topography simulation with SAMPLE-3D. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 1994, v:13, n:2, pp:219-230 [Journal]
   
7. Edward W. Scheckler, Nelson N. Tam, Anton K. Pfau, Andrew R. Neureuther
   An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verification. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 1993, v:12, n:9, pp:1345-1356 [Journal]
   
8. Edward W. Scheckler, Alexander S. Wong, Robert K. Wang, Goodwin R. Chin, John R. Camagna, Andrew R. Neureuther, Robert W. Dutton
   A utility-based integrated system for process simulation. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 1992, v:11, n:7, pp:911-920 [Journal]
   
9. Kenny K. H. Toh, Andrew R. Neureuther, Edward W. Scheckler
   Algorithms for simulation of three-dimensional etching. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 1994, v:13, n:5, pp:616-624 [Journal]
   
10. Alfred Kwok Kit Wong, Roberto Guerrieri, Andrew R. Neureuther
    Massively parallel electromagnetic simulation for photolithographic applications. [Citation Graph (0, 0)][DBLP]
    IEEE Trans. on CAD of Integrated Circuits and Systems, 1995, v:14, n:10, pp:1231-1240 [Journal]
    
11. Alexander S. Wong, Andrew R. Neureuther
    The intertool profile interchange format: a technology CAD environment approach [semiconductor technology]. [Citation Graph (0, 0)][DBLP]
    IEEE Trans. on CAD of Integrated Circuits and Systems, 1991, v:10, n:9, pp:1157-1162 [Journal]
    
12. 
    Crosstalk Noise Variation Assessment and Analysis for the Worst Process Corner. [Citation Graph (, )][DBLP]