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Publications of Author

1. Lars Liebmann, Jennifer Lund, Fook-Luen Heng, Ioana Graur
   Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking. [Citation Graph (0, 0)][DBLP]
   DAC, 2001, pp:79-84 [Conf]
   
2. Mark A. Lavin, Lars Liebmann
   CAD computation for manufacturability: can we save VLSI technology from itself? [Citation Graph (0, 0)][DBLP]
   ICCAD, 2002, pp:424-431 [Conf]
   
3. Fook-Luen Heng, Lars Liebmann, Jennifer Lund
   Application of automated design migration to alternating phase shift mask design. [Citation Graph (0, 0)][DBLP]
   ISPD, 2001, pp:38-43 [Conf]
   
4. Lars Liebmann
   Layout impact of resolution enhancement techniques: impediment or opportunity? [Citation Graph (0, 0)][DBLP]
   ISPD, 2003, pp:110-117 [Conf]
   
5. Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham
   TCAD development for lithography resolution enhancement. [Citation Graph (0, 0)][DBLP]
   IBM Journal of Research and Development, 2001, v:45, n:5, pp:651-666 [Journal]
   
6. Louis Scheffer, Lars Liebmann, Riko Rakojcic, David White
   Rules vs tools: what's the right way to address IC manufacturing complexity? [Citation Graph (0, 0)][DBLP]
   ISPD, 2007, pp:75-76 [Conf]
   
7. 
   Electrically driven optical proximity correction based on linear programming. [Citation Graph (, )][DBLP]