S. Chatterjee, Y. Kuo, J. Lu, J.-Y. Tewg, P. Majhi Electrical reliability aspects of HfO2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress. [Citation Graph (0, 0)][DBLP] Microelectronics Reliability, 2006, v:46, n:1, pp:69-76 [Journal]