Mark E. Law Process modeling for future technologies. [Citation Graph (0, 0)][DBLP] IBM Journal of Research and Development, 2002, v:46, n:2-3, pp:339-346 [Journal]
Deodatta R. Apte, Mark E. Law Comparison of iterative methods for AC analysis in PISCES-IIB. [Citation Graph (0, 0)][DBLP] IEEE Trans. on CAD of Integrated Circuits and Systems, 1992, v:11, n:5, pp:671-673 [Journal]
Mark E. Law Parameters for point-defect diffusion and recombination. [Citation Graph (0, 0)][DBLP] IEEE Trans. on CAD of Integrated Circuits and Systems, 1991, v:10, n:9, pp:1125-1131 [Journal]
Mark E. Law Grid adaption near moving boundaries in two dimensions for IC process simulation. [Citation Graph (0, 0)][DBLP] IEEE Trans. on CAD of Integrated Circuits and Systems, 1995, v:14, n:10, pp:1223-1230 [Journal]
Mark E. Law, Robert W. Dutton Verification of analytic point defect models using SUPREM-IV [dopant diffusion]. [Citation Graph (0, 0)][DBLP] IEEE Trans. on CAD of Integrated Circuits and Systems, 1988, v:7, n:2, pp:181-190 [Journal]
Minchang Liang, Mark E. Law An object-oriented approach to device simulation-FLOODS. [Citation Graph (0, 0)][DBLP] IEEE Trans. on CAD of Integrated Circuits and Systems, 1994, v:13, n:10, pp:1235-1240 [Journal]
Chih-Chuan Lin, Mark E. Law 2-D mesh adaption and flux discretizations for dopant diffusion modeling. [Citation Graph (0, 0)][DBLP] IEEE Trans. on CAD of Integrated Circuits and Systems, 1996, v:15, n:2, pp:194-207 [Journal]