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Alex Vayshenker: [Publications] [Author Rank by year] [Co-authors] [Prefers] [Cites] [Cited by]

Publications of Author

  1. Ernest Y. Wu, Edward J. Nowak, Alex Vayshenker, Wing L. Lai, David L. Harmon
    CMOS scaling beyond the 100-nm node with silicon-dioxide-based gate dielectrics. [Citation Graph (0, 0)][DBLP]
    IBM Journal of Research and Development, 2002, v:46, n:2-3, pp:287-298 [Journal]
  2. Ernest Y. Wu, Jordi Suñé, Wing L. Lai, Alex Vayshenker, E. Nowak, D. Harmon
    Critical reliability challenges in scaling SiO2-based dielectric to its limit. [Citation Graph (0, 0)][DBLP]
    Microelectronics Reliability, 2003, v:43, n:8, pp:1175-1184 [Journal]

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