Search the dblp DataBase

Publications of Author

1. Thomas Binder, Andreas Hössinger, Siegfried Selberherr
   Rigorous integration of semiconductor process and device simulators. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 2003, v:22, n:9, pp:1204-1214 [Journal]
   
2. Clemens Heitzinger, Andreas Hössinger, Siegfried Selberherr
   On smoothing three-dimensional Monte Carlo ion implantation simulation results. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 2003, v:22, n:7, pp:879-883 [Journal]
   
3. Andreas Hössinger, Erasmus Langer, Siegfried Selberherr
   Parallelization of a Monte Carlo ion implantation simulator. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 2000, v:19, n:5, pp:560-567 [Journal]
   
4. W. Wessner, J. Cervenka, Clemens Heitzinger, Andreas Hössinger, Siegfried Selberherr
   Anisotropic Mesh Refinement for the Simulation of Three-Dimensional Semiconductor Manufacturing Processes. [Citation Graph (0, 0)][DBLP]
   IEEE Trans. on CAD of Integrated Circuits and Systems, 2006, v:25, n:10, pp:2129-2139 [Journal]
   
5. Clemens Heitzinger, Andreas Hössinger, Siegfried Selberherr
   An algorithm for smoothing three-dimensional Monte Carlo ion implantation simulation results. [Citation Graph (0, 0)][DBLP]
   Mathematics and Computers in Simulation, 2004, v:66, n:2-3, pp:219-230 [Journal]