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Toshimitsu Ohmine: [Publications] [Author Rank by year] [Co-authors] [Prefers] [Cites] [Cited by]

Publications of Author

  1. Clemens Heitzinger, Wolfgang Pyka, Naoki Tamaoki, Toshiro Takase, Toshimitsu Ohmine, Siegfried Selberherr
    Simulation of arsenic in situ doping with polysilicon CVD and its application to high aspect ratio trenches. [Citation Graph (0, 0)][DBLP]
    IEEE Trans. on CAD of Integrated Circuits and Systems, 2003, v:22, n:3, pp:285-292 [Journal]

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