K. L. Ng, Nian Zhan, C. W. Kok, M. C. Poon, Hei Wong Electrical characterization of the hafnium oxide prepared by direct sputtering of Hf in oxygen with rapid thermal annealing. [Citation Graph (0, 0)][DBLP] Microelectronics Reliability, 2003, v:43, n:8, pp:1289-1293 [Journal]
Jackie Chan, Hei Wong, M. C. Poon, C. W. Kok Oxynitride gate dielectric prepared by thermal oxidation of low-pressure chemical vapor deposition silicon-rich silicon nitride. [Citation Graph (0, 0)][DBLP] Microelectronics Reliability, 2003, v:43, n:4, pp:611-616 [Journal]