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H. Y. Li:
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Publications of Author
- H. Y. Li, Y. J. Su, C. F. Tsang, S. M. Sohan, V. N. Bliznetsov, L. Zhang
Process improvement of 0.13mum Cu/Low K (Black DiamondTM) dual damascene interconnection. [Citation Graph (0, 0)][DBLP] Microelectronics Reliability, 2005, v:45, n:7-8, pp:1134-1143 [Journal]
- C. F. Tsang, C. K. Chang, A. Krishnamoorthy, K. Y. Ee, Y. J. Su, H. Y. Li, W. H. Li, L. Y. Wong
A study of post-etch wet clean on electrical and reliability performance of Cu/low k interconnections. [Citation Graph (0, 0)][DBLP] Microelectronics Reliability, 2005, v:45, n:3-4, pp:517-525 [Journal]
- C. F. Tsang, C. Y. Li, A. Krishnamoorthy, Y. J. Su, H. Y. Li, L. Y. Wong, W. H. Li, L. J. Tang, K. Y. Ee
Impact of barrier deposition process on electrical and reliability performance of Cu/CVD low k SiOCH metallization. [Citation Graph (0, 0)][DBLP] Microelectronics Journal, 2004, v:35, n:9, pp:693-700 [Journal]
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