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F. van Keulen: [Publications] [Author Rank by year] [Co-authors] [Prefers] [Cites] [Cited by]

Publications of Author

  1. C. Yuan, W. D. van Driel, R. van Silfhout, O. van der Sluis, R. A. B. Engelen, L. J. Ernst, F. van Keulen, G. Q. Zhang
    Delamination analysis of Cu/low-k technology subjected to chemical-mechanical polishing process conditions. [Citation Graph (0, 0)][DBLP]
    Microelectronics Reliability, 2006, v:46, n:9-11, pp:1679-1684 [Journal]

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