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V. N. Bliznetsov: [Publications] [Author Rank by year] [Co-authors] [Prefers] [Cites] [Cited by]

Publications of Author

  1. H. Y. Li, Y. J. Su, C. F. Tsang, S. M. Sohan, V. N. Bliznetsov, L. Zhang
    Process improvement of 0.13mum Cu/Low K (Black DiamondTM) dual damascene interconnection. [Citation Graph (0, 0)][DBLP]
    Microelectronics Reliability, 2005, v:45, n:7-8, pp:1134-1143 [Journal]
  2. C. F. Tsang, V. N. Bliznetsov, Y. J. Su
    Study and improvement of electrical performance of 130 nm Cu/CVD low k SiOCH interconnect related to via etch process. [Citation Graph (0, 0)][DBLP]
    Microelectronics Journal, 2003, v:34, n:11, pp:1051-1058 [Journal]

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